Description
High purity aluminum tubes and rotary targets are precision-formed cylindrical source materials designed for large-area magnetron sputtering and continuous deposition systems. Their tubular geometry enables uniform erosion, high material utilization, and extended target life compared to planar targets, making them ideal for high-volume thin film production with minimal downtime.
Available in purities from 4N (99.99%) to 5N (99.999%) depending on current inventory, these aluminum rotary targets deliver clean, low-contamination sputtering performance. Custom lengths, diameters, and bonding options are available to match specific deposition tool requirements.
Typical Applications:
Semiconductor wafer processing · Flat panel display and touch screen coatings · Architectural glass and large-area optical coatings · Solar cell and photovoltaic manufacturing · Decorative and functional PVD coatings · Aerospace and automotive component finishing · Industrial-scale thin film production.