Description
High purity aluminum starting sources are pre-formed or alloyed evaporation materials optimized for thermal, electron-beam, and vacuum deposition processes. Their controlled geometry and chemistry promote rapid, stable melting with minimal spitting or fractionation, delivering consistent deposition rates and high-quality thin films with low contamination.
Available in purities from 4N (99.99%) through 6N (99.9999%), including specialty alloy grades such as AlCu1%. Other alloys as AlSi, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd may be available. GDMS COA included with each shipment.
Typical Applications:
- Semiconductor thin film metallization
- Optical coatings and mirrors
- Solar cell contacts
- OLED and display manufacturing
- Compound semiconductor and quantum device fabrication
- Electron-beam and thermal evaporation systems
- University and national laboratory R&D