Home /Products /High Purity Aluminum Foil Coil
  • High purity aluminum foil coil, 4N, 0.004 inch thickness
  • High purity aluminum foil coil, 67mm width
  • High Purity Foil
  • High Purity Coils
1 5
High Purity Aluminum

High Purity Aluminum Foil Coil

High Purity Aluminum - Coil| SKU: varies by variant
From
$4,200.00 USD
$4,200.00 USD
Sale Sold out
Shipping calculated at checkout.
Download Safety Data Sheet Typical Chemical Analysis

GDMS COA included with each shipment. Most standard items ship within 1 to 2 business days.

View full details

High purity aluminum foil coil is supplied in continuous roll form, providing uniform material with excellent surface quality for applications requiring larger quantities or automated processing. This format supports consistent material input for battery, thin film, and research applications where purity, thickness control, and surface integrity are critical.

Available in purities from 4N (99.99%) to 6N (99.9999%) and a wide range of thicknesses and widths, high purity aluminum foil coil maintains low contamination levels suitable for sensitive electrochemical and thin film processes. GDMS COA included with each shipment.

Most standard items ship within 1–2 business days.  Custom widths, thicknesses, and reroll configurations are available to meet specific requirements.

Available Coil Specifications
•    Coils – Thickness 0.0012" to 0.024", Width up to 7" (except for 4N - 0.004" and 0.006" which we can do up to 17" width).
•    Slitting options available to widths as narrow as 1” width.
•    Reroll options are available for 4N only down to gauge as thin as 0.0005” (0.0127 mm), although MOQ (minimum order quantities) will apply.

Typical Applications:
•    Battery and supercapacitor current collectors
•    Lithium-ion and solid-state battery electrode substrates
•    Pouch cell battery manufacturing
•    Electrolytic capacitor foil
•    Electromagnetic shielding
•    Substrate material for thin film studies and flexible electronics
•    Specialty barrier and packaging films
•    Custom substrate fabrication for research and manufacturing

Related Articles 
Why University Researchers Choose HPA
SpaceX & Aerospace

 

Typical Applications

  • Semiconductor metallization and interconnect layers
  • Flat panel display and touch screen coatings
  • Optical coatings and precision mirrors
  • Hard disk drive media
  • Solar cell contacts
  • MEMS and sensor device fabrication
  • Decorative and functional PVD coatings
MaterialAluminum (Al)
Purity range4N (99.99%) to 6N (99.9999%)
Alloy optionsAlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd
Available diameters1" (25mm) to 12" (305mm)
Available thicknesses0.125" (3.2mm) to 1" (25.4mm)
Production methodDirectional solidification in vacuum (5N and above). Cast (4N).
FormsDisk, bonded assemblies, custom shapes
CertificationGDMS COA included with each shipment
Shipping1 to 2 business days (standard US), 2 to 5 days international
Custom ordersCustom sizes, thicknesses, alloys, and bonded assemblies available
What purity sputtering target do I need for semiconductor applications?
For semiconductor metallization and interconnect layers, 5N (99.999%) is the standard choice. For higher-end applications such as superconducting devices or quantum computing, 6N (99.9999%) targets reduce trace metal contamination to levels required by those processes. 4N targets are suitable for general thin-film coating and decorative applications.
Can I get a bonded sputtering target assembly?
Yes. HPA supplies bonded target assemblies designed to match your specific sputtering tool and process requirements. Contact us with your target design, backing plate specifications, and bonding requirements for a custom quote.
What is the difference between cast and directionally solidified targets?
HPA's super high purity targets (5N and above) are produced using directional solidification in vacuum, not cast. This process prevents inclusions from entering the metal, enabling us to maintain the highest purities. Cast targets at lower purities (4N) are suitable for applications where trace-level contamination is less critical.
What sizes are available and can you make custom sizes?
Stock sizes range from 1" (25mm) to 12" (305mm) in diameter with thicknesses from 0.125" (3.2mm) to 1" (25.4mm). Larger sizes and custom dimensions are available with short lead times. Contact us with your specifications.
Technical guide

All About Aluminum Sputtering Targets

A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.

Read article →
Deposition guide

The Essential Guide to Thin Film Deposition and Vacuum Coating

Understanding PVD, CVD, and vacuum coating processes for metals and how to choose the right source material.

Read article →
Quantum applications

Aluminum in Superconducting Qubit Fabrication

How high purity aluminum is used in superconducting qubit fabrication, including materials selection, purity requirements, and deposition methods.

Read article →