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High Purity Aluminum

High Purity Aluminum Rod Coil

High Purity Aluminum - Rod Coil| SKU: varies by variant
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$750.00 USD
$750.00 USD
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GDMS COA included with each shipment. Most standard items ship within 1 to 2 business days.

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High purity aluminum rod coil provides a continuous length of small-diameter rod in coil form, offering convenient handling and consistent feedstock for processes requiring repeatable material input. This format is particularly suitable for thermal evaporation, automated deposition systems, and research environments where reliable feed and minimal material handling are important.

Available in purities from 4N (99.99%) to 5N (99.999%), high purity aluminum rod coil delivers excellent ductility and low contamination levels for vacuum applications. GDMS COA included with each shipment.

Most items will ship within 1 to 2 days of confirmed order, unless sold out. 

Typical Applications:
•    Thermal evaporation feedstock
•    Automated vacuum deposition systems
•    Research and prototyping
•    Aerospace and defense specialty fabrication
•    High purity aluminum rod in coil form for continuous processes

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Typical Applications

  • Semiconductor metallization and interconnect layers
  • Flat panel display and touch screen coatings
  • Optical coatings and precision mirrors
  • Hard disk drive media
  • Solar cell contacts
  • MEMS and sensor device fabrication
  • Decorative and functional PVD coatings
MaterialAluminum (Al)
Purity range4N (99.99%) to 6N (99.9999%)
Alloy optionsAlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd
Available diameters1" (25mm) to 12" (305mm)
Available thicknesses0.125" (3.2mm) to 1" (25.4mm)
Production methodDirectional solidification in vacuum (5N and above). Cast (4N).
FormsDisk, bonded assemblies, custom shapes
CertificationGDMS COA included with each shipment
Shipping1 to 2 business days (standard US), 2 to 5 days international
Custom ordersCustom sizes, thicknesses, alloys, and bonded assemblies available
What purity sputtering target do I need for semiconductor applications?
For semiconductor metallization and interconnect layers, 5N (99.999%) is the standard choice. For higher-end applications such as superconducting devices or quantum computing, 6N (99.9999%) targets reduce trace metal contamination to levels required by those processes. 4N targets are suitable for general thin-film coating and decorative applications.
Can I get a bonded sputtering target assembly?
Yes. HPA supplies bonded target assemblies designed to match your specific sputtering tool and process requirements. Contact us with your target design, backing plate specifications, and bonding requirements for a custom quote.
What is the difference between cast and directionally solidified targets?
HPA's super high purity targets (5N and above) are produced using directional solidification in vacuum, not cast. This process prevents inclusions from entering the metal, enabling us to maintain the highest purities. Cast targets at lower purities (4N) are suitable for applications where trace-level contamination is less critical.
What sizes are available and can you make custom sizes?
Stock sizes range from 1" (25mm) to 12" (305mm) in diameter with thicknesses from 0.125" (3.2mm) to 1" (25.4mm). Larger sizes and custom dimensions are available with short lead times. Contact us with your specifications.
Technical guide

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A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.

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Quantum applications

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