Description
High purity aluminum sputtering targets are precision-machined source materials for physical vapor deposition (PVD) processes, including magnetron, RF, and DC sputtering. These targets are engineered to deliver consistent film properties with minimal metallic impurities that can degrade electrical, optical, or superconducting performance in thin film devices.
Available in purities from 4N (99.99%) through 6N (99.9999%), high purity aluminum targets provide excellent process stability and low contamination levels. Specialty alloy compositions, including AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd, are available for applications requiring tailored film chemistry. GDMS COA included with each shipment.
Most standard items ship within 1–2 business days. Custom sizes, thicknesses, and bonded target assemblies are available to meet specific tool and process requirements.
Typical Applications:
• Semiconductor metallization and interconnect layers
• Flat panel display and touch screen coatings
• Optical coatings and precision mirrors
• Hard disk drive media
• Solar cell contacts
• MEMS and sensor device fabrication
• Decorative and functional PVD coatings
Send us your target design for a custom quote
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