Description
High purity aluminum starting sources are pre-formed or alloyed evaporation materials designed for thermal evaporation, electron-beam evaporation, and vacuum deposition processes. Their controlled geometry and composition promote stable melting behavior, minimize spitting and fractionation, and support consistent deposition rates with low contamination.
Available in purities from 4N (99.99%) through 6N (99.9999%), including specialty alloy grades such as AlCu1%, these starting sources are used in applications where precise film composition and process stability are required. Additional alloy compositions, including AlSi, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd, may be available. GDMS COA included with each shipment.
Most starting sources are produced to order, with limited standard configurations maintained in stock. Lead times vary depending on alloy, quantity, and current workload.
Typical Applications:
• Semiconductor thin film metallization
• Optical coatings and mirrors
• Solar cell contacts
• OLED and display manufacturing
• Compound semiconductor and quantum device fabrication
• Electron-beam and thermal evaporation systems
• University and national laboratory R&D
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