High purity aluminum blocks are rectangular products designed for applications requiring low impurity levels, consistent material properties, and high performance at cryogenic temperatures. Produced from aluminum refined through directional solidification under vacuum, these blocks offer exceptionally low inclusion content, enabling high Residual Resistivity Ratio (RRR) performance critical for superconducting RF (SRF) cavities, quantum computing hardware, and other advanced cryogenic systems.
We maintain stock of several rectangular block sizes, including 50 × 95 × 165 mm, 70 × 165 × 170 mm, 89 × 89 × 244 mm, and larger formats up to 95 × 229 × 305 mm. Custom sizes and machining services are available upon request.
Blocks are offered in purities from 4N (99.99%) to 6N (99.9999%), with full GDMS Certificates of Analysis provided with every shipment. Specialty alloy compositions, including AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd, can also be supplied to meet specific application
Typical Applications:
• Remelting and custom alloy casting
• Large-format sputtering target fabrication
• High-RRR components for superconducting RF cavities
• Machined parts for quantum computing and superconducting qubit systems
• Precision feedstock for aerospace, defense, and semiconductor research
• University and national laboratory R&D programs
Most standard items ship within 1–2 business days. Custom sizes and machining services are available to support specialized project requirements.
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Typical Applications
- Semiconductor metallization and interconnect layers
- Flat panel display and touch screen coatings
- Optical coatings and precision mirrors
- Hard disk drive media
- Solar cell contacts
- MEMS and sensor device fabrication
- Decorative and functional PVD coatings
Send us your target design for a custom quote
| Material | Aluminum (Al) |
| Purity range | 4N (99.99%) to 6N (99.9999%) |
| Alloy options | AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd |
| Available diameters | 1" (25mm) to 12" (305mm) |
| Available thicknesses | 0.125" (3.2mm) to 1" (25.4mm) |
| Production method | Directional solidification in vacuum (5N and above). Cast (4N). |
| Forms | Disk, bonded assemblies, custom shapes |
| Certification | GDMS COA included with each shipment |
| Shipping | 1 to 2 business days (standard US), 2 to 5 days international |
| Custom orders | Custom sizes, thicknesses, alloys, and bonded assemblies available |
What purity sputtering target do I need for semiconductor applications?
Can I get a bonded sputtering target assembly?
What is the difference between cast and directionally solidified targets?
What sizes are available and can you make custom sizes?
All About Aluminum Sputtering Targets
A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.
Read article →The Essential Guide to Thin Film Deposition and Vacuum Coating
Understanding PVD, CVD, and vacuum coating processes for metals and how to choose the right source material.
Read article →Aluminum in Superconducting Qubit Fabrication
How high purity aluminum is used in superconducting qubit fabrication, including materials selection, purity requirements, and deposition methods.
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