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High Purity Aluminum

Ultra-Pure Aluminum - 6N5 MBE Grade

High Purity Aluminum| SKU: varies by variant
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Regular price $4,250.00 USD
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GDMS COA included with each shipment. Most standard items ship within 1 to 2 business days.

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Ultra-Pure Aluminum 6N5 MBE Grade – Highest Purity Source Material for Demanding MBE & UHV Applications

Ultra-pure aluminum 6N5 MBE Grade is HPA’s highest-purity aluminum source material at 99.99995% (6N5), specially developed for molecular beam epitaxy (MBE) and ultra-high-vacuum (UHV) thin film deposition. This grade minimizes trace impurities that can compromise film quality, device performance, and research reproducibility in the most demanding environments.

Sold by sealed glass jar only (we do not break jars). Each pellet is individually packaged in argon-purged glass jars to prevent oxidation and contamination during handling and storage. Every lot includes full GDMS analysis with complete elemental traceability. GDMS COA included with each shipment.

Available Pellet Sizes (priced per sealed glass jar):

  • Small Jar: 6 mm diameter × 20 mm length — 1.5 g per pellet, 10 pellets per jar (≈ 15 g total)
  • Large Jar: 10 mm diameter × 40 mm length — 8.5 g per pellet, 5 pellets per jar (≈ 42.5 g total)

Typical Applications:

  • Molecular beam epitaxy (MBE) source material
  • Compound semiconductor growth
  • Ultra-high-vacuum (UHV) thin film deposition
  • Quantum well and superlattice device fabrication
  • High-electron-mobility transistor (HEMT) research
  • Advanced photonics and optoelectronics
  • University and national laboratory MBE systems

Larger quantities and volume pricing available — contact us for multi-jar orders or custom configurations.

Related Articles 
What Is the Highest Purity Aluminum?
Maintaining Purity During Processing and Alloying
Aluminum in Superconducting Qubit Fabrication
Cryogenic Applications 

Typical Applications

  • Semiconductor metallization and interconnect layers
  • Flat panel display and touch screen coatings
  • Optical coatings and precision mirrors
  • Hard disk drive media
  • Solar cell contacts
  • MEMS and sensor device fabrication
  • Decorative and functional PVD coatings

Send us your target design for a custom quote

MaterialAluminum (Al)
Purity range4N (99.99%) to 6N (99.9999%)
Alloy optionsAlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd
Available diameters1" (25mm) to 12" (305mm)
Available thicknesses0.125" (3.2mm) to 1" (25.4mm)
Production methodDirectional solidification in vacuum (5N and above). Cast (4N).
FormsDisk, bonded assemblies, custom shapes
CertificationGDMS COA included with each shipment
Shipping1 to 2 business days (standard US), 2 to 5 days international
Custom ordersCustom sizes, thicknesses, alloys, and bonded assemblies available
What purity sputtering target do I need for semiconductor applications?
For semiconductor metallization and interconnect layers, 5N (99.999%) is the standard choice. For higher-end applications such as superconducting devices or quantum computing, 6N (99.9999%) targets reduce trace metal contamination to levels required by those processes. 4N targets are suitable for general thin-film coating and decorative applications.
Can I get a bonded sputtering target assembly?
Yes. HPA supplies bonded target assemblies designed to match your specific sputtering tool and process requirements. Contact us with your target design, backing plate specifications, and bonding requirements for a custom quote.
What is the difference between cast and directionally solidified targets?
HPA's super high purity targets (5N and above) are produced using directional solidification in vacuum, not cast. This process prevents inclusions from entering the metal, enabling us to maintain the highest purities. Cast targets at lower purities (4N) are suitable for applications where trace-level contamination is less critical.
What sizes are available and can you make custom sizes?
Stock sizes range from 1" (25mm) to 12" (305mm) in diameter with thicknesses from 0.125" (3.2mm) to 1" (25.4mm). Larger sizes and custom dimensions are available with short lead times. Contact us with your specifications.
Technical guide

All About Aluminum Sputtering Targets

A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.

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Deposition guide

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Quantum applications

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How high purity aluminum is used in superconducting qubit fabrication, including materials selection, purity requirements, and deposition methods.

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