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What Is the Highest Purity Aluminum?


The purest form of aluminum is 99.99995%, also known as 6N5 MBE (molecular beam epitaxy) grade. This highest purity level achievable for aluminum is required for single-crystal thin film deposition.

What Is the Highest Purity Aluminum?

About Aluminum Purity

Generally, the purity of aluminum is denoted in 'nines.' For instance, 4N (four nines) aluminum is 99.99% purity. This is a popular choice in several industrial applications due to the balance of purity and cost effectiveness. Typical use cases include capacitor foils and high-end electrical components production, where superior conductivity and resistance to corrosion are essential. Most importantly, 4N aluminum has few impurities, which ensures electronic device longevity and high performance.

Further up the scale, there is 5N aluminum (99.999%), which contains even fewer impurities than 4N. It's produced from 4N aluminum through a highly-precise, expensive refinement process. In comparison to 4N aluminum, 5N is more expensive, produced on a smaller scale, and typically made in smaller batches. 

Beyond 5N Aluminum

After 5N, there are 5N5 (99.9995%) and 6N (99.9999%) aluminum grades. Each ascending grade requires more effort and cost to produce. The increased cost is due to the amount of aluminum discarded during the refinement process. In general, as aluminum is refined to higher purities, the yield from the starting weight decreases. For this reason, 6N is even more costly and time consuming to produce. 

However, there is demand for ultra high purity forms in fields like electronics and thin film deposition. The summit of aluminum purity is 6N5 MBE grade, which boasts 99.99995% purity. The process for achieving 6N5 purity involves eliminating impurities to meet the stringent demands of MBE thin-film deposition. To guarantee this purity, it is necessary to pack each piece of 6N5 in sterilized, argon gas-filled packaging to prevent any contamination.

Single-Crystal Thin Film Deposition with 6N5 MBE Grade

The single-crystal thin film deposition involves the epitaxial growth of thin films using molecular beam epitaxy (MBE) or similar techniques. By utilizing 6N5 MBE grade aluminum as the starting material, manufacturers ensure the creation of high-quality, defect-free, thin films, which are essential for advanced semiconductor devices and nanotechnology applications. 

The Chemical Properties of Different Aluminum Grades

In 4N aluminum, total non-aluminum elements (such as iron, silicon, copper, and magnesium) only make up a maximum of 100 parts per million (ppm). For 5N aluminum, this limit is reduced to 10 ppm, whereas for 6N aluminum, it's just 1 ppm. At 6N5 purity, the maximum total limit of non-aluminum elements is further limited to just 0.5 ppm.

Higher purities of aluminum are employed in specialized technological applications, such as high-precision optics and advanced scientific instruments. The lower impurity levels enhance thermal and electrical conductivity, making the material ideal for high-performance and sensitive environments.

For a deeper look at different aluminum purities and their applications, explore our comprehensive Aluminum Purities Guide. Discover the role of each of the aluminum grades in various industries and technological advancements.

HPA Distribution supplies a wide range of high-purity and ultra high purity aluminum grades, from 4N through 6N5 MBE. Visit our store to learn more.


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Frequently asked questions

Purity selection for evaporation processes

Common questions answered by the HPA technical team.

Will I see a measurable difference between 5N and 6N in my films?

In standard semiconductor or optical applications, the difference is often subtle. In quantum devices, high-performance RF resonators, or ultra-low-loss coatings, the improvement in Q-factor, coherence time, or defect density can be significant.

Does higher purity reduce spitting during evaporation?

Indirectly yes. Lower impurity content and better-controlled surface oxides generally produce cleaner, more stable evaporation behavior with reduced particle generation.

When should I choose 4N6 instead of 5N?

4N6 is often sufficient for many semiconductor metallization layers, general optical coatings, and applications where the performance gains from 5N do not justify the higher cost.

Is 6N always better than 5N?

Not always. For many production processes, 5N provides excellent results at a significantly lower cost. Reserve 6N for applications where the highest possible film quality and reproducibility are critical.