High purity aluminum plates, sheets, and foils are flat-rolled forms engineered for applications requiring precise thickness control, excellent surface quality, and minimal metallic impurities. These materials are widely used as substrates, electrode blanks, and structural components in thin film deposition, electrochemical systems, and advanced research where material purity directly influences film quality, interface properties, and device performance.
Available in purities from 4N (99.99%) through 6N (99.9999%), high purity aluminum foil, sheet, and plate offer the traceability and surface integrity required for sensitive processes, including quantum computing and superconducting RF applications. We have CNC machining service partner if custom machining is needed. GDMS COA included with each shipment.
Most standard items ship within 1–2 business days. Custom sizes, thicknesses, and processing (including machining, slitting and rerolling) are available to meet specific research or production requirements.
• Foil — Thickness 0.0012" to 0.024", Width up to 7" (except for 4N - 0.004" and 0.006" which we can do up to 17" width), Available in Cut Lengths or in Coils
• Coils – we can slit foil coils as narrow as 1” width with various ID cores. Reroll options are available to as thin gauge as 0.0005” (0.0127 mm), although MOQ (minimum order quantities) will apply.
• Sheet — Thickness 0.025" to 0.10", Width up to 15.75" (400 mm)
• Plate — Thickness 0.125" to 2", Width up to 15.75" (400 mm), Lengths up to 60"
Typical Applications:
• Substrate material for thin film deposition and subsequent materials characterization
• Electrode blanks for electrochemical and energy storage research
• Battery current collector prototyping
• Custom machined components for vacuum systems
• Optical and aerospace component fabrication
• Quantum computing and superconducting RF (SRF) applications
• University and industrial R&D
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Typical Applications
- Semiconductor metallization and interconnect layers
- Flat panel display and touch screen coatings
- Optical coatings and precision mirrors
- Hard disk drive media
- Solar cell contacts
- MEMS and sensor device fabrication
- Decorative and functional PVD coatings
Send us your target design for a custom quote
| Material | Aluminum (Al) |
| Purity range | 4N (99.99%) to 6N (99.9999%) |
| Alloy options | AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd |
| Available diameters | 1" (25mm) to 12" (305mm) |
| Available thicknesses | 0.125" (3.2mm) to 1" (25.4mm) |
| Production method | Directional solidification in vacuum (5N and above). Cast (4N). |
| Forms | Disk, bonded assemblies, custom shapes |
| Certification | GDMS COA included with each shipment |
| Shipping | 1 to 2 business days (standard US), 2 to 5 days international |
| Custom orders | Custom sizes, thicknesses, alloys, and bonded assemblies available |
What purity sputtering target do I need for semiconductor applications?
Can I get a bonded sputtering target assembly?
What is the difference between cast and directionally solidified targets?
What sizes are available and can you make custom sizes?
All About Aluminum Sputtering Targets
A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.
Read article →The Essential Guide to Thin Film Deposition and Vacuum Coating
Understanding PVD, CVD, and vacuum coating processes for metals and how to choose the right source material.
Read article →Aluminum in Superconducting Qubit Fabrication
How high purity aluminum is used in superconducting qubit fabrication, including materials selection, purity requirements, and deposition methods.
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