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High Purity Aluminum

Aluminum Sputtering Targets

High Purity Aluminum - Disks (Sputtering Targets)| SKU: varies by variant
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$350.00 USD
$350.00 USD
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GDMS COA included with each shipment. Most standard items ship within 1 to 2 business days.

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High purity aluminum sputtering targets are precision-machined source materials for physical vapor deposition (PVD) processes, including magnetron, RF, and DC sputtering. These targets are engineered to deliver consistent film properties with minimal metallic impurities that can degrade electrical, optical, or superconducting performance in thin film devices.

Available in purities from 4N (99.99%) through 6N (99.9999%), high purity aluminum targets provide excellent process stability and low contamination levels. Specialty alloy compositions, including AlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, and AlNd, are available for applications requiring tailored film chemistry. GDMS COA included with each shipment.

Most standard items ship within 1–2 business days.  Custom sizes, thicknesses, and bonded target assemblies are available to meet specific tool and process requirements.

Typical Applications:
•    Semiconductor metallization and interconnect layers
•    Flat panel display and touch screen coatings
•    Optical coatings and precision mirrors
•    Hard disk drive media
•    Solar cell contacts
•    MEMS and sensor device fabrication
•    Decorative and functional PVD coatings

Send us your target design for a custom quote

Related Articles: 
All About Aluminum Sputtering Targets
Thin Film Deposition Guide
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Typical Applications

  • Semiconductor metallization and interconnect layers
  • Flat panel display and touch screen coatings
  • Optical coatings and precision mirrors
  • Hard disk drive media
  • Solar cell contacts
  • MEMS and sensor device fabrication
  • Decorative and functional PVD coatings

Send us your target design for a custom quote

Chemical Analysis Contact Us for Custom Sizes
MaterialAluminum (Al)
Purity range4N (99.99%) to 6N (99.9999%)
Alloy optionsAlSi, AlCu, AlCuSi, AlMg, AlMgSi, AlNi, AlNd
Available diameters1" (25mm) to 12" (305mm)
Available thicknesses0.125" (3.2mm) to 1" (25.4mm)
Production methodDirectional solidification in vacuum (5N and above). Cast (4N).
FormsDisk, bonded assemblies, custom shapes
CertificationGDMS COA included with each shipment
Shipping1 to 2 business days (standard US), 2 to 5 days international
Custom ordersCustom sizes, thicknesses, alloys, and bonded assemblies available
What purity sputtering target do I need for semiconductor applications?
For semiconductor metallization and interconnect layers, 5N (99.999%) is the standard choice. For higher-end applications such as superconducting devices or quantum computing, 6N (99.9999%) targets reduce trace metal contamination to levels required by those processes. 4N targets are suitable for general thin-film coating and decorative applications.
Can I get a bonded sputtering target assembly?
Yes. HPA supplies bonded target assemblies designed to match your specific sputtering tool and process requirements. Contact us with your target design, backing plate specifications, and bonding requirements for a custom quote.
What is the difference between cast and directionally solidified targets?
HPA's super high purity targets (5N and above) are produced using directional solidification in vacuum, not cast. This process prevents inclusions from entering the metal, enabling us to maintain the highest purities. Cast targets at lower purities (4N) are suitable for applications where trace-level contamination is less critical.
What sizes are available and can you make custom sizes?
Stock sizes range from 1" (25mm) to 12" (305mm) in diameter with thicknesses from 0.125" (3.2mm) to 1" (25.4mm). Larger sizes and custom dimensions are available with short lead times. Contact us with your specifications.
Technical guide

All About Aluminum Sputtering Targets

A comprehensive guide to aluminum sputtering target materials, purities, and applications for thin film deposition.

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Deposition guide

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Quantum applications

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How high purity aluminum is used in superconducting qubit fabrication, including materials selection, purity requirements, and deposition methods.

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